IMAGE SENSOR FOR X-RAY AND METHOD OF MANUFACTURING THE SAME
摘要
PURPOSE: An image sensor for an X-ray and a manufacturing method thereof are provided to prevent the deformation like warpage or twist of a substrate after depositing a thick film and performing a high temperature process using the metal material with high melting point and small thermal expansion coefficient. CONSTITUTION: A thin film transistor is formed after forming a buffer layer(116) on a metal substrate with the thickness of 0.2 to 5 mm. A protection layer is formed to cover the thin film transistor. A contact hole is formed to expose a gate contact electrode(222) connected to the gate electrode of the thin film transistor. A first electrode connected to the gate contact electrode is formed on the protection layer through the contact hole. A semiconductor layer of a photo diode is formed on the first electrode. A second electrode(232) is formed on the semiconductor layer. The common electrode is formed to connect to the second electrode. A metal substrate with the thin film transistor, the photo diode, and the common electrode has the thickness of 20 to 200 um.
申请公布号
KR100935644(B1)
申请公布日期
2010.01.07
申请号
KR20090022693
申请日期
2009.03.17
申请人
SILICON DISPLAY TECHNOLOGY
发明人
HUR, JI HO;NAM, YOUN DUCK;KIM, HYO JUN;KANG, MOON HYO;HONG, SUNG JUN