| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a sputtering composite target forming a transparent conductive film into which a stable fixed amount of oxygen defect can be introduced, and which has satisfactory light transmission, low electric resistance and satisfactory conductivity, to provide a method for producing a transparent conductive film using the same, and to provide a transparent conductive film-fitted base material. <P>SOLUTION: The sputtering composite target 1 comprises an oxide base component 2 including indium oxide and carbon base components 3a to 3d, and in the case the oxide base component 2 and the carbon base components 3a to 3d are different substances, respectively, the carbon base components 3a to 3d are stacked on at least a part of the surface of the oxide base component 2, so as to be used. In the method for producing a transparent conductive film, using a sputtering composite target comprising an oxide base component including indium oxide and carbon base components, a transparent conductive film is formed on the substrate. The transparent conductive film-fitted base material is obtained by forming a transparent conductive film on a plastic sheet or a film. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
