| 发明名称 |
PROCESSING SYSTEM AND METHOD FOR PERFORMING HIGH THROUGHPUT NON-PLASMA PROCESSING |
| 摘要 |
<p>Embodiments of apparatus (100) and methods for performing high throughput non-plasma processing are generally described herein. Other embodiments may be described and claimed.</p> |
| 申请公布号 |
KR20090127323(A) |
申请公布日期 |
2009.12.10 |
| 申请号 |
KR20097020570 |
申请日期 |
2008.03.03 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
LIMURO SHUNICHI |
| 分类号 |
H01L21/02;H01L21/306;H01L21/677;H01L21/687 |
主分类号 |
H01L21/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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