发明名称 |
DUMMY LIGHT-EXPOSED SUBSTRATE, METHOD OF MANUFACTURING THE SAME, IMMERSION EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD |
摘要 |
A dummy light-exposed substrate used for dummy light-exposure in an immersion exposure apparatus which exposes a substrate to light via a projection optical system and a liquid, comprises a lyophilic region, and a liquid repellent region surrounding the lyophilic region.
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申请公布号 |
US2009305149(A1) |
申请公布日期 |
2009.12.10 |
申请号 |
US20090479636 |
申请日期 |
2009.06.05 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KITAMURA TSUYOSHI;YABU NOBUHIKO |
分类号 |
G03F1/00;G03B27/52;G03F7/20;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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