发明名称 DUMMY LIGHT-EXPOSED SUBSTRATE, METHOD OF MANUFACTURING THE SAME, IMMERSION EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 A dummy light-exposed substrate used for dummy light-exposure in an immersion exposure apparatus which exposes a substrate to light via a projection optical system and a liquid, comprises a lyophilic region, and a liquid repellent region surrounding the lyophilic region.
申请公布号 US2009305149(A1) 申请公布日期 2009.12.10
申请号 US20090479636 申请日期 2009.06.05
申请人 CANON KABUSHIKI KAISHA 发明人 KITAMURA TSUYOSHI;YABU NOBUHIKO
分类号 G03F1/00;G03B27/52;G03F7/20;H01L21/027 主分类号 G03F1/00
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