| 发明名称 |
POLYMER AND PHOTOSENSITIVE RESIN COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer excellent in reactivity of polarity changes in the presence of an acid. <P>SOLUTION: The polymer includes a structure expressed by the formula of the figure and glycerin mono(meth)acrylate as structural units. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2009280684(A) |
申请公布日期 |
2009.12.03 |
| 申请号 |
JP20080133380 |
申请日期 |
2008.05.21 |
| 申请人 |
SHOWA HIGHPOLYMER CO LTD |
发明人 |
ENDO MITSUO;OGAWA KOSHI;ICHIKAWA TAKAO |
| 分类号 |
C08F220/30;C08F212/14;G03F7/038;H01L21/027 |
主分类号 |
C08F220/30 |
| 代理机构 |
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