METHOD OF FORMING PHOTOSENSITIVE RESIN FILM, METHOD OF FORMING SILICA-BASED COATING FILM, AND DEVICE AND MEMBER INCLUDING SILICA-BASED COATING FILM

摘要

PROBLEM TO BE SOLVED: To provide a method of forming a photosensitive resin film with which a silica-based coating film usable as an interlayer dielectric is relatively easily formed and which is excellent in process margin and makes a formed silica-based film excellent in resolution and heat resistance, and to provide a method of forming a silica-based coating film using the same.

SOLUTION: The method of forming the photosensitive resin film includes a step of coating the top of a substrate with a photosensitive resin composition comprising a siloxane resin obtained by hydrolytic condensation of a specific silane compound, a solvent in which the siloxane resin dissolves and a naphthoquinonediazidesulfonic acid ester and carrying out vacuum drying to form a photosensitive resin film.

COPYRIGHT: (C)2010,JPO&INPIT