Pellicle for use in semiconductor lithography

摘要

A pellicle used in semiconductor lithography is provided and includes a photomask adhesive layer for affixing the pellicle to a photomask. The photomask adhesive layer has a surface layer and a lower layer. The lower layer has one or more sub-layers. A Young's modulus of the surface layer is higher than a Young's modulus of any sub-layer forming the lower layer.