发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTO-SPACER
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high storage stability in a liquid state and giving a cured product excellent in compression strength and deformation recovering property after compressive deformation after the composition is cured. <P>SOLUTION: The photosensitive resin composition contains (A) a resin having a branched and/or alicyclic structure, an acidic group and an ethylenically unsaturated bond in side chains, (B) a polymerizable compound, (C) a photopolymerization initiator and (D) a hydrophilic organic solvent having a boiling point of 150&deg;C or higher. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009258353(A) 申请公布日期 2009.11.05
申请号 JP20080106732 申请日期 2008.04.16
申请人 FUJIFILM CORP 发明人 ITO KORESHIGE;NAKAMURA HIDEYUKI
分类号 G03F7/038;C08F290/12;G02F1/1339;G03F7/004;G03F7/032 主分类号 G03F7/038
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