发明名称 PREPROCESSING METHOD IN FORMING DIFFUSION LAYER
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a preprocessing method for selectively forming a diffusion layer on the surface of a substrate while preventing a smear or a spread on a pattern after application using an inkjet system. <P>SOLUTION: This preprocessing method includes a step of forming a liquid-repellent layer on a substrate before forming a diffusion layer by selectively applying a diffuser for forming silicon-containing coating using the inkjet system. Such the liquid-repellent layer is preferably formed using a liquid-containing organic silazane compound or a metal compound capable of generating a hydroxyl group by hydrolysis. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2009253145(A) 申请公布日期 2009.10.29
申请号 JP20080101383 申请日期 2008.04.09
申请人 TOKYO OHKA KOGYO CO LTD 发明人 MORITA TOSHIRO;TANITSU KATSUYA;HIRAI TAKAAKI;MUROTA ATSUSHI
分类号 H01L21/225;H01L31/04 主分类号 H01L21/225
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