发明名称 FIELD-EFFECT TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To incorporate a Schottky barrier diode with small forward voltage drop at the time of switching-on in a field effect transistor by a GaN-based compound semiconductor used as a switching element of a matrix converter. SOLUTION: The field effect transistor has a source electrode S, a drain electrode D and a gate electrode G, which are formed on a semiconductor layer 11 by a nitride gallium-based compound material. A Schottky electrode 14 which is Schottky-bonded to an electron supply layer 13 between the gate electrode G and the drain electrode D, and the drain electrode D is formed in the transistor. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009246045(A) 申请公布日期 2009.10.22
申请号 JP20080088768 申请日期 2008.03.28
申请人 FURUKAWA ELECTRIC CO LTD:THE 发明人 RI KO;MASUDA MITSURU;YOSHIDA KIYOTERU
分类号 H01L27/095;H01L21/338;H01L29/47;H01L29/778;H01L29/812;H01L29/872 主分类号 H01L27/095
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