发明名称 |
FIELD-EFFECT TRANSISTOR AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To incorporate a Schottky barrier diode with small forward voltage drop at the time of switching-on in a field effect transistor by a GaN-based compound semiconductor used as a switching element of a matrix converter. SOLUTION: The field effect transistor has a source electrode S, a drain electrode D and a gate electrode G, which are formed on a semiconductor layer 11 by a nitride gallium-based compound material. A Schottky electrode 14 which is Schottky-bonded to an electron supply layer 13 between the gate electrode G and the drain electrode D, and the drain electrode D is formed in the transistor. COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2009246045(A) |
申请公布日期 |
2009.10.22 |
申请号 |
JP20080088768 |
申请日期 |
2008.03.28 |
申请人 |
FURUKAWA ELECTRIC CO LTD:THE |
发明人 |
RI KO;MASUDA MITSURU;YOSHIDA KIYOTERU |
分类号 |
H01L27/095;H01L21/338;H01L29/47;H01L29/778;H01L29/812;H01L29/872 |
主分类号 |
H01L27/095 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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