MASK FOR SILICON CRYSTALLIZATION, METHOD OF FORMING POLY-SILICON THIN FILM, AND MANUFACTURING METHOD OF THIN FILM TRANSISTOR

摘要

A silicon crystallization mask of the present invention includes; a main exposure portion including a plurality of complete light transmission regions which completely transmit light therethrough, and a preliminary exposure portion including a plurality of incomplete light transmission regions, which each partially transmit light therethrough, wherein at least two of the incomplete light transmission regions have different magnitudes of light transmittance from each other.