发明名称 PATTERN MEASURING METHOD AND PATTERN MEASURING DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method and device for performing accurate matching, even when there is deformation of some patterns and a magnification error between a template and an SEM image during matching, using the template including a plurality of patterns. <P>SOLUTION: As one method of solving this problem, the method of performing a matching selectively using a part of the plurality of patterns arranged in a predetermined region of design data, and a device for achieving it are provided. As another method of solving the problem, the method of performing a first matching, based on the plurality of patterns arranged in the predetermined region of design data, then performing a second matching using a part of the plurality of patterns arranged in the predetermined region, and a device for achieving it are provided. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2009222609(A) 申请公布日期 2009.10.01
申请号 JP20080068656 申请日期 2008.03.18
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SATO HIDETOSHI;MATSUOKA RYOICHI
分类号 G01B15/04;G03F1/36;G03F1/84;H01J37/22;H01L21/027;H01L21/66 主分类号 G01B15/04
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