发明名称 |
Lactone-containing compound, polymer, resist composition, and patterning process |
摘要 |
<p>Lactone-containing compounds having formula (1) are novel wherein R 1 is H, F, methyl or trifluoromethyl, R 2 and R 3 are H or monovalent hydrocarbon groups, or R 2 and R 3 may together form an aliphatic hydrocarbon ring, R 4 is H or CO 2 R 5 , R 5 is a monovalent hydrocarbon group, W is CH 2 , O or S, and k 1 is 3, 4 or 5. They are useful as monomers to produce polymers which are transparent to radiation s 500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.</p> |
申请公布号 |
EP2100887(A1) |
申请公布日期 |
2009.09.16 |
申请号 |
EP20090003396 |
申请日期 |
2009.03.09 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HASEGAWA, KOJI;SHINACHI, SATOSHI;KOBAYASHI, KATSUHIRO;NISHI, TSUNEHIRO;KINSHO, TAKESHI |
分类号 |
C07D307/83;C07D307/85;C07D311/74;C07D313/08;C07D493/22;G03F7/00 |
主分类号 |
C07D307/83 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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