| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an atmospheric pressure plasma processing method and device capable of securing plasma treatment of high reliability as it can check a lighting state of plasma and an irradiation state of plasma after plasma lighting, in treating a treated object with atmospheric plasma. <P>SOLUTION: In the atmospheric pressure plasma treatment method of supplying first gas 15 to a given reaction space 11 in the vicinity of an atmospheric pressure, and at the same time, impressing a high-frequency voltage on an antenna 13 or an electrode in the vicinity of the reaction space 11 to generate primary plasma 16, irradiating the primary plasma 16 or a secondary plasma 21 generated by colliding the primary plasma 16 with second gas 18 toward a treated surface 6 to carry out plasma treatment of the treated surface 6, a dimension of a reflective wave after lighting of primary plasma 16 is detected, and it is to be checked whether the primary plasma 16 is lit by comparing the dimension of the reflective wave with a first given value. <P>COPYRIGHT: (C)2009,JPO&INPIT |
