MULTILAYER REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY DEVICES COMPRISING FIRST AND SECOND ADDITIONAL INTERMEDIATE LAYERS

摘要

To increase the maximum reflectivity of reflective optical elements at an operating wavelength in the EUV or soft x-ray wavelength range, a first additional intermediate layer (23a, 23b) for increasing the reflectivity and a second additional intermediate layer (24a, 24b) for preventing chemical interaction between the first additional intermediate layer (23a, b) and the adjoining spacer layer (21 ) and/or absorber layer (22) are provided between the absorber layer (22) and the spacer layer (21).