发明名称 Constructions Comprising Hafnium Oxide And/Or Zirconium Oxide
摘要 The invention includes ALD-type methods in which two or more different precursors are utilized with one or more reactants to form a material. In particular aspects, the precursors are hafnium and aluminum, the only reactant is ozone, and the material is hafnium oxide predominantly in a tetragonal crystalline phase.
申请公布号 US2009195967(A1) 申请公布日期 2009.08.06
申请号 US20090422788 申请日期 2009.04.13
申请人 MICRON TECHNOLOGY, INC. 发明人 SRIVIDYA CANCHEEPURAM V.;ROCKLEIN NOEL;VERNON JOHN;NELSON JEFF;GEALY F. DANIEL;KORN DAVID
分类号 H01G4/06;H01L29/92 主分类号 H01G4/06
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