发明名称 SEMICONDUCTOR APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor apparatus including a Schottky barrier diode obtaining high voltage resistance and using a nitride semiconductor. SOLUTION: A semiconductor apparatus includes: an n+ type semiconductor substrate 1; an n- type drift region 2 formed on the upper surface of the n+ type semiconductor substrate 1; an anode electrode 3 formed on the upper surface of the n- type drift region 2 and forming a Schottky junction A with the n- type drift region 2; and a cathode electrode 4 electrically connected to the n+ type semiconductor substrate 1. The semiconductor apparatus also includes trenches 5 selectively formed on the surface of the n- type drift region 2, and the trench 5 is burred by the anode electrode 3. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009177028(A) 申请公布日期 2009.08.06
申请号 JP20080015453 申请日期 2008.01.25
申请人 TOSHIBA CORP 发明人 SAITO WATARU
分类号 H01L29/47;H01L29/872 主分类号 H01L29/47
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