发明名称 UNEVENNESS FORMATION DEVICE, AND INFORMATION INPUT DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an unevenness formation device capable of preventing the increase of the size of the device, and allowing adjustment of the displacement of an uneven shape in multiple steps; and an information input device. <P>SOLUTION: The unevenness formation part (unevenness formation device) 40 includes: a deformation part 41 having a lamination structure which includes an elastomer layer 42a and an elastomer layer 42b each having insulating properties, and having extension amounts, to application voltage, different from each other, and in which the elastomer layer 42a is sandwiched between an electrode 43a and an electrode 43b, and the elastomer layer 42b is sandwiched between the electrode 43a and an electrode 43c; and sidewalls 44 fixing side parts of the deformation part 41. The deformation part 41 is deformed into an uneven shape by selectively applying a voltage to the whole or part of the elastomer layer 42a and the elastomer layer 42b. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009176439(A) 申请公布日期 2009.08.06
申请号 JP20080011020 申请日期 2008.01.22
申请人 FUNAI ELECTRIC CO LTD 发明人 MIYATAKE MASAKATSU;CHOJI HIDEKI
分类号 H01H13/14;G06F3/041 主分类号 H01H13/14
代理机构 代理人
主权项
地址