METHOD OF AFTERTREATMENT OF AMORPHOUS HYDROCARBON FILM AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE BY USING THE AFTERTREATMENT METHOD

摘要

The functional groups in the outermost surface of an amorphous hydrocarbon film are replaced. An amorphous hydrocarbon film (110) is formed over a silicon substrate (Sub) coated with a low-k film (105). The amorphous hydrocarbon film (110) is heated not in a silane gas atmosphere. Immediately after the heating, the amorphous hydrocarbon film (110) is heated in a silane gas atmosphere. After this heating, a film (115) such as a hard mask is formed.