| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To reduce unevenness caused by drifting occurring in the beam minor axis direction without adding a new beam shaping device, while not affecting beam propagation characteristics in an optical resonator. <P>SOLUTION: The laser annealing apparatus comprises a dislocation detector 12 which detects the dislocation of laser beam B before passing a beam shaping optical system 5, an angular deviation detector 16 which detects the angular deviation of the laser beam B before passing the beam shaping optical system 5, a polarizing mirror 8b which polarizes the laser beam B and is arranged on an optical path between a laser oscillator 1 and an object (substrate 7), and mirror control means (21 and 22) which, based on the detection data detected with the dislocation detector 12 and the angular deviation detector 16, control the orientation of the polarizing mirror 8b so as to eliminate the dislocation of a linear beam LB from a reference radiation position in the minor axis direction on an irradiated plane. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
