High voltage trench insulated gate bipolar transistor with trench having impurity injection layer and Method for manufacturing the same,申请号KR20070088710-传众专利搜索

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发明名称	High voltage trench insulated gate bipolar transistor with trench having impurity injection layer and Method for manufacturing the same
摘要
申请公布号	KR100910798(B1)	申请公布日期	2009.08.05
申请号	KR20070088710	申请日期	2007.09.01
申请人		发明人
分类号	H01L29/78;H01L21/336	主分类号	H01L29/78
代理机构		代理人
主权项
地址

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