METHOD AND DEVICE FOR PATTERN INSPECTION

摘要

PROBLEM TO BE SOLVED: To provide a device and a method for pattern inspection capable of inspecting the formation of a hole with high accuracy. SOLUTION: The pattern inspection device 1 includes: an image taking part 2 for obtaining multivalued images by taking image of an object to be inspected; a memory part 35 for storing a master image representing the ideal condition of the object to be inspected; a hole erased image taking part 32 for obtaining a hole erased image, which is the image taken by the image taking part 2 from which the hole image is erased; a location obtaining part 33 for obtaining location data of the hole from the image taken by the image taking part 2; a prohibited data generating part 34 for generating the data of the region covering the hole for which the location data are obtained as prohibited data; and a determination part 36 for determining the formation of the hole by comparing the hole erased image and the master image with respect to an area other than the area where the prohibited data are generated. COPYRIGHT: (C)2009,JPO&INPIT