发明名称 METHOD FOR DETECTING DEFECTS WITH COMPARISON BETWEEN OPTICAL IMAGE CONTOURS
摘要 A method for detecting defects using the comparison of optical image contours is provided to detect the non-formation deformity of the contact hole pattern by comparing the contours of the contact hole pattern image obtained from the two check fields. An image of patterns within two check fields is obtained. The color level of image pixels(103,105,107) is recognized and the pixel more than the standard value is selected. Contours(201,203) of pattern image are calculated by connecting the selected pixels. The contours of pattern image of two check fields are compared, and then the deformity is detected. In the step of obtaining the image contour of the pattern, the pixels which are adjacent to each other and have value greater than the standard are connected.
申请公布号 KR20090071739(A) 申请公布日期 2009.07.02
申请号 KR20070139618 申请日期 2007.12.28
申请人 HYNIX SEMICONDUCTOR INC. 发明人 PARK, CHAN HA
分类号 H01L21/66 主分类号 H01L21/66
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