| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus capable of carrying out high-speed substrate transfer when a deposition processing, etc., is carried out on a large substrate. SOLUTION: The vacuum processing apparatus includes a transfer chamber 10, first processing chambers 12-1 and 12-2, second processing chambers 12-3 and 12-4, first substrate transfer trucks 20-1 and 20-2, and second substrate transfer trucks 20-3 and 20-4. The transfer chamber 10 extends in an X direction, and includes a first transfer area 10-1 and a second transfer area 10-2. The first processing chambers 12-1 and 12-2 are connected to the side of the first transfer area 10-1, while the second processing chambers 12-3 and 12-4 are connected to the side of the second transfer area 10-2. The first substrate transfer trucks 20-1 and 20-2 move in the first transfer area 10-1, while the second substrate transfer trucks 20-3 and 20-4 move in the second transfer area 10-2. The first substrate transfer trucks 20-1 and 20-2 transfer a substrate 2 to/from at least one of the second processing chambers 12-3 and 12-4 and the first processing chambers 12-1 and 12-2, while second substrate transfer trucks 20-3 and 20-4 transfer the substrate 2 to/from the second processing chambers 12-3 and 12-4. COPYRIGHT: (C)2009,JPO&INPIT
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