发明名称 SEMICONDUCTOR N-DIODE (TUNNEL)
摘要 A semiconductor N-diode comprises a substrate of n-type (n-region), a layer of p-type (p-region), ohm contacts and electrodes. Between n and p regions, it is formed an epitaxial compensated layer of c-type, which is at once alloyed with a donor and an acceptor having equal concentrations.
申请公布号 UA41727(U) 申请公布日期 2009.06.10
申请号 UA20080013121U 申请日期 2008.11.12
申请人 HLADKYI BOHDAN IVANOVYCH;HLADKYI ROMAN BOHDANOVYCH 发明人
分类号 H01L29/88 主分类号 H01L29/88
代理机构 代理人
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