| 摘要 |
A plant for vacuum-plasma treatment of articles, which contains a working chamber with the isolated carrier of articles, emission chamber with the exhaustible cathode, which is connected with a working chamber at least through one orifice, basal source of feed, the positive pole of which is connected with the body of the emission chamber, and the negative pole of which is connected with the exhaustible cathode, auxiliary source of feed, the positive pole of which is connected with the carrier of articles, and a negative pole is connected with the body of the emission chamber. The body of the emission chamber is isolated from the body of the working chamber. |
