TEMPERATURE CONTROL METHOD, METHOD OF OBTAINING TEMPERATURE CORRECTION VALUE, METHOD OF MANUFACTURING SEMICONDUCTOR AND SUBSTRATE TREATMENT APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method for effectively using detection temperatures for temperature control when there are detection temperatures whose number exceeds the division number of a heater, in a thermal treatment furnace. SOLUTION: In the temperature control method in which a target temperature is given in a thermal treatment furnace 1 and a plurality of heaters 2 are controlled according to the target temperature, a virtual temperature is calculated on the basis of the detection temperature of a profile temperature sensor 15 provided inside the thermal treatment area 9 of the thermal treatment furnace 1, and the heater 2 is controlled so that the virtual temperature is coincident with the target temperature. COPYRIGHT: (C)2009,JPO&INPIT