| 摘要 |
<p>The arrangement has a probe gas path (10) and a carrier gas path (15), which are both attached at carrier gas source (12). Controlled dosing equipment (4) is arranged for locking a probe gas stopper into the carrier gas stream. A flow resistance (11) lies between the carrier gas source and the dosing equipment. The gas volume (19) of the probe gas path is measured between the diversion of the connecting gas path (17) and another flow resistance (20) in such a manner that probe stopper is reached only after cutting and diversing the dosing quantity to the latter flow resistance.</p> |
