| 摘要 |
To provide a substrate holding apparatus that can rapidly recover liquid that has infiltrated the rear surface side of a substrate. A substrate holding apparatus (PH) comprises: a base (PHB); a first support part (46), which is formed on the base (PHB) and supports a rear surface (Pb) of a substrate to be processed (P); a first circumferential wall part (42), which is formed on the base (PHB) and is provided so that it opposes the rear surface (Pb) of the substrate to be processed (P) and surrounds the first support part (46); and a first recovery port (51), which is provided on the outer side of the first circumferential wall part (42); wherein, the flow of a gas along the first circumferential wall part (42) moves the liquid (LQ) on the outer side of the first circumferential wall part (42) to the first recovery port (51), where the liquid is recovered. |
