发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <p>Problem to be Solved To provide a photosensitive resin composition which has good processability even in a relatively low temperature condition near room temperature and exhibits good efficiency in removing debris generated while shaping a printing plate by laser engraving. Solution A photosensitive resin composition, characterized by comprising: (a) 100 parts by mass of a resin having a number average molecular weight of 1,000 or more; and (b) 0.1 to 10 parts by mass of ultrafine particles having a number average particle diameter of primary particles of 5 nm or more and 100 nm or less; wherein the photosensitive resin composition has a viscosity at 20°C of 50 Pa·s or more and 10,000 Pa·s or less; and a precursor composition, which is obtained by excluding the component (b) from the photosensitive resin composition, has a viscosity at 20°C of 5 Pa·s or more and 500 Pa·s or less.</p>
申请公布号 EP2060405(A1) 申请公布日期 2009.05.20
申请号 EP20070806628 申请日期 2007.09.04
申请人 ASAHI KASEI CHEMICALS CORPORATION 发明人 FUNAKOSHI, SHINJI;OKITA, KOSHI;YAMADA, HIROSHI;TOMEBA, KEI
分类号 B41N1/12;G03F7/00;G03F7/004 主分类号 B41N1/12
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