发明名称 Method of fabricating suspended structure
摘要 A method of fabricating a suspended structure. First, a substrate including a photoresist layer hardened by heat is provided. Subsequently, the hardened photoresist layer is etched so as to turn the photoresist layer into a predetermined edge profile. Thereafter, a structure layer is formed on parts of the substrate and parts of the photoresist layer. Next, a dry etching process is performed so as to remove the photoresist layer, and to turn the structure layer into a suspended structure.
申请公布号 US7531457(B2) 申请公布日期 2009.05.12
申请号 US20060561902 申请日期 2006.11.21
申请人 TOUCH MICRO-SYSTEM TECHNOLOGY INC. 发明人 KANG YU-FU;YANG CHEN-HSIUNG
分类号 H01L21/20 主分类号 H01L21/20
代理机构 代理人
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