发明名称 Target acquisition and overlay metrology based on two diffracted orders imaging
摘要 In one embodiment, a system includes a beam generator for directing at least one incident beam having a wavelength lambda towards a periodic target having structures with a specific pitch p. A plurality of output beams are scattered from the periodic target in response to the at least one incident beam. The system further includes an imaging lens system for passing only a first and a second output beam from the target. The imaging system is adapted such that the angular separation between the captured beams, lambda, and the pitch are selected to cause the first and second output beams to form a sinusoidal image. The system also includes a sensor for imaging the sinusoidal image or images, and a controller for causing the beam generator to direct the at least one incident beam towards the periodic target or targets, and for analyzing the sinusoidal image or images.
申请公布号 US7528953(B2) 申请公布日期 2009.05.05
申请号 US20060363755 申请日期 2006.02.27
申请人 KLA-TENCOR TECHNOLOGIES CORP. 发明人 FROMMER AVIV;LEVINSKI VLADIMIR;SMITH MARK D.;BYERS JEFFREY;MACK CHRIS A.;ADEL MICHAEL E.
分类号 G01B11/00;G06K9/00 主分类号 G01B11/00
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