| 摘要 |
PROBLEM TO BE SOLVED: To allow a thermal treatment providing correct optical reflectivity appropriately corresponding to a treatment object having various patterns formed on, for instance, a surface, and keeping the temperature of the treatment object as desired, based on the optical reflectivity. SOLUTION: In order to correctly obtain effective absorption rate on a surface of a semiconductor substrate, an angular distribution of irradiation light intensity (angular intensity distribution) by a first light source used for calculation of the effective absorption rate is adapted to an angular intensity distribution by a second light source used for an annealing process. By making such a first light source equivalent to the second light source, optical reflectivity on the surface of the semiconductor substrate depending on the light intensity distribution to the light irradiation angle of the irradiation light of the first light source, that is, effective reflectivity, is obtained. COPYRIGHT: (C)2009,JPO&INPIT |
