| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an adjustment method for measuring the polarization state under actual exposure conditions and adjusting the polarization state. <P>SOLUTION: The adjustment method for adjusting the illumination state in illuminating an original plate, by using an illumination optical system and projecting an image of a pattern formed on the original plate onto a substrate via an projection optical system has a step of determining a target region in the pattern of the original plate; a measuring step of measuring the polarization state and the angle distribution of a light which has passed through the illumination optical system; the target region of the original plate and the projection optical system, in a state where the original plate is disposed on an object plane of the projection optical system; and an adjustment step of adjusting the polarization state of the light and the optical intensity distribution thereof, on the basis of a result of measurement in the measuring step. <P>COPYRIGHT: (C)2009,JPO&INPIT |
