发明名称 |
SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING THE SAME AND IMAGE DISPLAY |
摘要 |
<p>Disclosed is a semiconductor device wherein semiconductor elements are formed at a higher density. Also disclosed are a method for manufacturing such a semiconductor device and an image display using such a semiconductor device. Specifically disclosed is a semiconductor device characterized by comprising a resin film having a through hole penetrating the film from one side to the other side, an organic semiconductor arranged within the through hole, an insulating film covering one end of the organic semiconductor, a gate electrode covering the insulating film, a source electrode electrically connected with the other end of the organic semiconductor, and a drain electrode electrically connected with the other end of the organic semiconductor.</p> |
申请公布号 |
WO2009019865(A1) |
申请公布日期 |
2009.02.12 |
申请号 |
WO2008JP02124 |
申请日期 |
2008.08.06 |
申请人 |
PANASONIC CORPORATION;NAKATANI, SEIICHI;YAMASHITA, YOSHIHISA;KITAE, TAKASHI;SAWADA, SUSUMU |
发明人 |
NAKATANI, SEIICHI;YAMASHITA, YOSHIHISA;KITAE, TAKASHI;SAWADA, SUSUMU |
分类号 |
H01L21/336;H01L21/28;H01L29/786;H01L51/05;H01L51/30;H01L51/40;H01L51/50;H05B33/02;H05B33/10 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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