Prepn. of integrated circuit elements

摘要

A photolithographic resist comprising a substrate (I), a photoresist (II) and a light-absorbing imageable anti-reflective coating (III) between the (I) and (II), the (III) comprising a thin, essentially continuous layer of polybutene sulphone contg. a dye, and the (III) being imageable by light of the same wavelength as the (II) and being developable and removable with the (II).