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发明名称
METHOD FOR MANUFACTURING PHOTORESIST PATTERN
摘要
申请公布号
KR20060074491(A)
申请公布日期
2006.07.03
申请号
KR20040113244
申请日期
2004.12.27
申请人
DONGBU ELECTRONICS CO., LTD.
发明人
JEON, BYOUNG TAK
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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