| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pattern forming method which enables the precise formation of the pattern of a functional wiring film respect to a line width, a shape, or the like, and to prepare the functional film. <P>SOLUTION: A planned pattern is divided into sub-regions prior to forming the functional film and a plurality of the sub-regions are classified into a plurality of groups not adjacent to each other. First, drawing and drying are performed with respect to the first group to form wiring films 38a, 38b and 38d and drawing is subsequently performed with respect to the second group to form liquid patterns 33c, 33e, 33f and 33g. Thereafter, the integrated functional film is completed through a drying process. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
