发明名称 Pattern formation method and functional film
摘要 A pattern formation method, in which a functional film of a specified pattern is formed on a substrate using a droplet discharging method, includes: establishing a plurality of sub-regions that divide a design pattern of the functional film; conducting a first plotting step by disposing a first liquid so as to plot a borderline between the sub-regions; and conducting a second plotting step by disposing a second liquid which contains a functional material functioning mainly as the functional film so as to plot the plurality of sub-regions after the first plotting step.
申请公布号 US2006088702(A1) 申请公布日期 2006.04.27
申请号 US20050244804 申请日期 2005.10.06
申请人 SEIKO EPSON CORPORATION 发明人 SAKAI SHINRI;HIRAI TOSHIMITSU
分类号 B05D5/00;B41M5/00 主分类号 B05D5/00
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