| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of fabricating a color-filter layer, wherein the possibility of the occurrence of alignment errors of black matrix, and errors in the assembly of the color filter layer is reduced effectively. <P>SOLUTION: The method of fabricating the color filter layer is provided. First, an active device array substrate having an opaque metal pattern formed thereon is provided. Next, a backside exposure process is performed on the active device array substrate, by using the opaque metal layer as a mask to form a black matrix defining a plurality of pixel regions. Then, a plurality of color filter patterns is formed in the pixel regions. <P>COPYRIGHT: (C)2008,JPO&INPIT |
