AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, AND KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING

摘要

Disclosed is an aqueous dispersion for chemical mechanical polishing, which contains abrasive grains (A), an organic acid (B), a water-soluble polymer (C), an oxidizing agent (D) and water (E). The weight average molecular weight of the water-soluble polymer (C) is 50,000-5,000,000. ® KIPO & WIPO 2009