发明名称 Lithographic apparatus, method for calibrating and device manufacturing method
摘要 To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is used. Pixels are selectively activated singly or in groups.
申请公布号 US7459710(B2) 申请公布日期 2008.12.02
申请号 US20070705147 申请日期 2007.02.12
申请人 ASML NETHERLANDS B.V. 发明人 BASELMANS JOHANNES JACOBUS MATHEUS;BLEEKER ARNO JAN
分类号 G01N21/86;G03F7/20;H01L21/027 主分类号 G01N21/86
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