| 摘要 |
An exposure apparatus (EX) includes: an optical system (PL) having an optical element (20) on which a first exposure light (EL1) and a second exposure light (EL2) are incident, the first exposure light and the second exposure light from the optical element being irradiated onto a first exposure field (AR1) and a second exposure field (AR2); and a detection device (8) that detects at least one of the first exposure light and the second exposure light, which are from the optical element and are directed towards a different direction from directions towards the first and second exposure fields.
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