| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which is excellent in formation of a fine pattern even if a light shielding pigment is added at high concentration, and which is suitable for use as a black matrix material for a high light shielding or high definition color filter. <P>SOLUTION: The photosensitive resin composition for a black matrix contains (i) an alkali soluble resin having a carboxylic acid residue and a polymerizable unsaturated group in one molecule, (ii) a photopolymerizable monomer having at least one ethylenically unsaturated bond, (iii) a photopolymerization initiator and (iv) a light shielding pigment as essential components. <P>COPYRIGHT: (C)2009,JPO&INPIT |
