| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a composition for polishing and a polishing method, which polishes a nickel phosphorous-plated disc substrate more suitably. <P>SOLUTION: This composition for polishing comprises: a pad degrading inhibitor selected from a diethylenetriamine penta-acetic acid, a hydroxy ethyl ethylenediamine triacetic acid, a triethylenetetramine hexa-acetic acid and a glutamic acid diacetic acid, and their alkali metal salts and ammonium salts; and an oxidizer. Preferably, the composition further comprises at least one kind of a phenol compound, a phosphate and abrasive grain. This composition is preferably used together with a suede type polishing pad. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
