| 摘要 |
PROBLEM TO BE SOLVED: To provide a recessed pattern formation method for maintaining a recessed shape, and to provide a manufacturing method of a trench capacitor having improved performance. SOLUTION: Although a peripheral region 30 of a recess having height equal to that of the open end face position of the recess D is formed by a material 3, no deposition materials enter the recess D since the recess D is covered in advance with dry film resist DF. Therefore, even after the dry film resist DF is removed, the shape of the recess D is maintained, thus manufacturing a trench capacitor having improved performance. COPYRIGHT: (C)2009,JPO&INPIT
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