发明名称 |
CONDUCTOR PATTERN FORMING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of forming conductor patterns that copes with a fine pitch of a semiconductor chip electrode. <P>SOLUTION: The conductor pattern forming method comprises the steps of forming a plurality of copper patterns 110 on one surface of a substrate 100; pressing a part of the copper patterns 110 from the thickness direction to thereby form partly wider regions 112 on the copper patterns 110; making solder powder adhere to each copper pattern 110; and melting the solder powder on the copper pattern for the formation of solder plating having bumps. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008205232(A) |
申请公布日期 |
2008.09.04 |
申请号 |
JP20070040270 |
申请日期 |
2007.02.21 |
申请人 |
TEXAS INSTR JAPAN LTD |
发明人 |
ITO CHIZUKO;MASUMOTO MUTSUMI |
分类号 |
H01L23/12;H01L21/60;H05K3/34 |
主分类号 |
H01L23/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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