发明名称 CONDUCTOR PATTERN FORMING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of forming conductor patterns that copes with a fine pitch of a semiconductor chip electrode. <P>SOLUTION: The conductor pattern forming method comprises the steps of forming a plurality of copper patterns 110 on one surface of a substrate 100; pressing a part of the copper patterns 110 from the thickness direction to thereby form partly wider regions 112 on the copper patterns 110; making solder powder adhere to each copper pattern 110; and melting the solder powder on the copper pattern for the formation of solder plating having bumps. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008205232(A) 申请公布日期 2008.09.04
申请号 JP20070040270 申请日期 2007.02.21
申请人 TEXAS INSTR JAPAN LTD 发明人 ITO CHIZUKO;MASUMOTO MUTSUMI
分类号 H01L23/12;H01L21/60;H05K3/34 主分类号 H01L23/12
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