REWORK DEVICE FOR SEMICONDUCTOR WAFER

摘要

A rework device for semiconductor wafer is provided to prevent an outflow of particles to an outside by isolating a regeneration space of a wafer from the outside. A rework chamber provides a rework space isolated from external air. A turntable unit(300) includes a plurality of wafer fixing parts(310) formed at an upper periphery part thereof. The turntable unit performs a rotating operation and a stopping operation to supply a wafer(100) as a rework target to the inside of the rework chamber and to draw the reworked wafer from the rework chamber. An injection nozzle is positioned in the inside of the rework chamber to inject a media onto the wafer supplied from the turntable unit.