| 摘要 |
An apparatus for supplying source gas is provided to maintain a constant deposition pressure in a deposition chamber by controlling a pressure of the source gas in real-time. An apparatus for supplying source gas includes a source vaporizer, a sensor unit(25), and a controller(26). The source vaporizer heats a source material, such that the source gas is generated. The sensor unit checks a pressure of the source vaporizer. The controller adjusts a pressure of the source gas, which is introduced to the deposition chamber, according to a check result from the sensor unit. A transfer gas supply unit(24) supplies a transfer gas for delivering the source gas to the deposition chamber. The sensor unit prevents the source gas from being deposited on the sensor unit.
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