| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning apparatus that detects a wafer on which failures such as inadequate cleaning occurs and that determines chemical supply time, in a cleaning process where rise time to make flow rate stable accounts for a half or more of the chemical supply time. SOLUTION: The cleaning apparatus includes: a flow meter provided on a supply line for supplying a chemical to an ejecting section for the wafer; a control section for transmitting signals for opening a valve on the supply line; a means for obtaining an integral value of a chemical flow rate in a predetermined period after the signal is transmitted based on the measurement result of the flow meter; and a warning means for warning about the cleaning of the wafer if the obtained integral value is out of a range of a predetermined reference to the integral value of the chemical flow rate. COPYRIGHT: (C)2008,JPO&INPIT
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